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Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

SHENZHEN JINGHUI INDUSTRY LIMITED
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  • 7 yrs

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Product Highlights

  • High Purity Options: Available in 96% and 99.6% Al2O3 purity for diverse electronic needs.
  • Customizable Dimensions: Thickness 0.1-2.0mm, with specific length and width customization available.
  • Excellent Thermal Conductivity: High thermal conductivity ensures efficient heat dissipation for semiconductors.
  • High Mechanical Strength: Superior flexural strength and fracture toughness for durable packaging.
  • Low Dielectric Loss: Reduces signal delay and increases transmission speed in circuits.
  • Versatile Laser Processing: Supports precise laser cutting and scribing with tight tolerances.

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Product Images of Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor pictures & photos
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor pictures & photos
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor pictures & photos
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor pictures & photos
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor pictures & photos
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor pictures & photos
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
    Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
    Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
    Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
    Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
    Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
  • Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
    Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

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Product Description

Custom Electronic Industrial 96% 99.6% Aluminium Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

Manufacturing Capacity

1. Product Specification

The table below shows our standard sizes. If you need customization, please contact us.

Alumina Ceramic Substrate
99.6% Al2O3
Thickness (mm) Maximum Size (mm) Shape Molding Technique
As Fired Lapped Polished Rectangular Square Round
0.1-0.2   50.8 50.8   √ √ Tape Casting
0.25   114.3 114.3   √   Tape Casting
0.38 120 114.3 114.3   √   Tape Casting
0.5 120 114.3 114.3   √   Tape Casting
0.635 120 114.3 114.3   √   Tape Casting
Other special thicknesses within the thickness range of 0.1-0.635mm can be achieved by lapping.
96% Al2O3
Thickness (mm) Maximum Size (mm) Shape Molding Technique
As Fired Lapped Polished Rectangular Square Round
0.25 120 114.3 114.3   √   Tape Casting
0.3 120 114.3 114.3   √   Tape Casting
0.38 140×190     √     Tape Casting
0.5 140×190     √     Tape Casting
0.635 140×190     √     Tape Casting
0.76 130×140     √     Tape Casting
0.8 130×140     √     Tape Casting
0.89 130×140     √     Tape Casting
1 280×240     √     Tape Casting
1.5 165×210     √     Tape Casting
2 500×500     √     Tape Casting
Other special thicknesses within the thickness range of 0.1-2.0mm can be achieved by lapping.

2. Product Tolerances
Alumina Ceramic Substrate
Item Substrate Thickness (mm) Standard Tolerance (mm) Best Tolerance (mm) Laser Cutting Tolerance (mm)
Length and Width Tolerance / ±2   ±0.15
Thickness Tolerance T<0.3 ±0.03 ±0.01  
0.30-1.0 ±0.05 ±0.01  
T>1.0 ±10% ±0.01  

3. Surface Roughness
Alumina Ceramic Substrate
Material Surface Roughness (μm)
As Fired Lapped Polished
96% Al2O3 Ra 0.2-0.75 Ra 0.3-0.7 Ra ≤0.05
99.6% Al2O3 Ra 0.05-0.15 Ra 0.1-0.5 Ra ≤0.05

4. Laser Processing

(1) Hole Size
Alumina Ceramic Substrate
Hole Diameter (mm) Standard Tolerance (mm)
φ≤0.5 0.08
φ>0.5 0.2

(2) Laser Scribing
Alumina Ceramic Substrate
Substrate Thickness (mm) Laser Scribe Line Depth
to Thickness (%)
0.2-0.3 40%±5%
0.3<T≤0.5 50%±3%
0.5<T≤1.0 43%±3%
1.2 55%±3%
1.5 55%±3%
2.0 55%+10%
The scribing spot can be in different sizes. Generally, there are small spots 0.03-0.04mm (Substrate Thickness≤0.5mm ) and large spots 0.08-0.1mm (Substrate Thickness>0.5mm), and the accuracy is ±0.01mm.
 

Product Features

Ceramic substrates are ideal packaging base materials for new generation integrated circuits and power electronic modules. Compared with plastic and metal substrates, ceramic substrates have the following advantages.

1. Good Insulation
Generally speaking, the higher the substrate resistance, the better the reliability of the package. Ceramic materials are generally covalent bond compounds with better insulation properties.

2. Low Dielectric Coefficient and Good Frequency Performance
The low dielectric constant and dielectric loss of ceramic materials can reduce the signal delay time and increase the transmission speed.

3. Small Coefficient of Thermal Expansion (CTE)
Covalent bond compounds generally have high melting points, and the higher the melting point, the smaller the thermal expansion coefficient, so the CTE of ceramic materials is generally small.

4. High Thermal Conductivity
Ceramic substrate materials are widely used in aviation, aerospace, and other engineering projects for high-reliability, high-frequency, high-temperature-resistant, and highly airtight product packaging. The packaging of ceramic substrate materials is generally a multilayer ceramic substrate package, which is widely used in hybrid integrated circuits (HIC) and multi-chip module (MCM) ceramic packages.

Material Properties

 
Alumina Ceramic Substrate
Item Unit 96% Al2O3 99.6% Al2O3
Mechanical Properties
Color / / White White
Density Drainage Method g/cm3 ≥3.70 ≥3.95
Light Reflectivity 400nm/1mm % 94 83
Flexural Strength Three Point Bending MPa >350 >500
Fracture Toughness Indentation Method MPa·m1/2 3.0 3.0
Vickers Hardness Load 4.9N GPa 14 16
Young's Modulus Stretching Method GPa 340 300
Water Absorption    % 0 0
Camber / Length‰ T≤0.3: ≤5‰, Others: ≤3‰ ≤3‰
Thermal Properties
Max. Service Temperature (Non-loading) / ºC 1200 1400
CTE (Coefficient of
Thermal Expansion)
20-800ºC 1×10-6/ºC 7.8 7.9
Thermal Conductivity 25ºC W/m·K >24 >29
Thermal Shock Resistance 800ºC ≥10 Times No Crack No Crack
Specific Heat 25ºC J/kg·k 750 780
Electrical Properties
Dielectric Constant 25ºC, 1MHz / 9.4 9.8
Dielectric Loss Angle 25ºC, 1MHz ×10-4 ≤3 ≤2
Volume Resistivity 25ºC Ω·cm ≥1014 ≥1014
Dielectric Strength DC KV/mm ≥15 ≥15
 

Product Applications

1. 96% Alumina

96% alumina is the standard material for thick film circuit substrates. It has excellent electrical insulation properties, mechanical strength, good thermal conductivity, chemical durability, and dimensional stability. Its surface roughness is generally 0.2-0.6 μm, and the maximum operating temperature of the substrate can reach 1600°C.


Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

 


2. 99.6% Alumina

99.6% alumina is the primary material used in most thin-film circuit substrates. It has higher purity and smaller grain size. When made into a substrate, it has the advantage of excellent surface smoothness (surface roughness generally 0.08- 0.1um), and the max. The operating temperature of the substrate can reach 1700°C.


Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

Production Process

Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

Product Inspection

Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

Product Recommendations

We offer bare ceramic substrates in various raw materials, sizes, shapes, and thicknesses. Welcome to communicate with us.

View More

Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor
Custom Electronic Industrial 96% 99.6% Aluminum Oxide Thin Thick Film Circuit Al2O3 High Alumina Ceramic Substrate for Semiconductor

 

About the Supplier

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SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED
SHENZHEN JINGHUI INDUSTRY LIMITED

About Our Factory & Business Background

Address
1st Bldg, No. 6352, Pingshan Ave., Shatian Community, Kengzi, Pingshan, Shenzhen, Guangdong, China
Terms of Payment
LC, T/T, PayPal, Western Union, Small-amount payment, Money Gram, RMB
International Commercial Terms(Incoterms)
FOB, CFR, CIF, DAT, FAS, DDP, DAP, CIP, CPT, FCA, EXW
Average Lead Time
Peak Season Lead Time: 1-3 months
Off Season Lead Time: within 15 workdays
Nearest Port
Shenzhen, HongKong, Shanghai

Our Production Capability & Technical Expertise

Main Products
Metallized Ceramics, Ceramic Substrates, Pepper Mill Mechanism, Pepper Grinder Mechanism, Ceramic Parts, Precision Ceramics, Zirconia Ceramics, Ceramic Insulators, Silicon Nitride Ceramics, Aluminum Nitride Ceamics

Our Industry Experience & Global Business Record

Export Year
2009-03-11
Main Markets
North America, South America, Eastern Europe, Southeast Asia, Africa, Oceania, Mid East, Eastern Asia, Western Europe

FAQ

What purity levels are available for the Alumina Ceramic Substrate?
We offer two main purity levels: 96% Al2O3 for thick film circuits and 99.6% Al2O3 for thin film circuits.
Can the thickness and size of the substrate be customized?
Yes, standard thickness ranges from 0.1mm to 2.0mm, and custom lengths and widths are available upon request.
What are the key advantages of ceramic substrates over plastic or metal ones?
Ceramic substrates offer good insulation, low dielectric coefficient, small thermal expansion coefficient, and high thermal conductivity.
Is laser processing supported for these ceramic substrates?
Yes, we support laser cutting and scribing with precise tolerances for hole sizes and scribe line depths.
What are the main applications for these Alumina Ceramic Substrates?
They are widely used in electronic devices, lighting, power supplies, and semiconductor manufacturing as packaging base materials.

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