0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer

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Product Details
Customization: Available
Application: Electronic Devices, Lighting, Power Supply, Semiconductors
Material: Al2O3
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  • 0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer
  • 0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer
  • 0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer
  • 0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer
  • 0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer
  • 0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer
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  • Overview
  • Product Description
  • Manufacturing Capacity
  • Applications
  • Why Choose Us?
Overview

Basic Info.

Model NO.
JJBP-0112-0005
Forming Method
Tape Casting
Purity
99.6%
Features
High Mechanical Strength, Small Dielectric Loss
Thickness Tolerance
±0.03mm
Length and Width Tolerance
±2mm
Customized Service
OEM, ODM, Prototyping, Mass Production
Transport Package
Individual Packaging
Specification
50.8*50.8mm (Max. )
Trademark
JingHui
Origin
China
HS Code
6914100000
Production Capacity
50000 Pieces/Month

Packaging & Delivery

Package Size
27.00cm * 17.00cm * 20.00cm
Package Gross Weight
2.000kg

Product Description

0.1mm 0.2mm Ultra-thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer

Product Description

1. Thickness

The thicker the alumina ceramic wafer, the better the strength and the stronger the pressure resistance, but the thermal conductivity is worse than that of the thinner one. On the contrary, the thinner the wafer, the weaker the strength and pressure resistance than the thicker one, but the thermal conductivity is stronger.

2. Shape

Most of the alumina ceramic wafers are single-sided or double-sided. The shape of the wafer is generally rectangular, square, or round.

3. Size

The size of the alumina ceramic wafer is not the bigger the better, mainly because the base material is made of ceramics, and it is easy to cause the wafer to break during the PCB proofing process, resulting in a lot of waste.

4. Forming Method

Common ceramic wafer forming methods mainly include dry pressing, isostatic pressing, and tape casting.

Dry pressing has high density and good wafer flatness, but low production efficiency and high cost, making it difficult to prepare ultra-thin wafers.

Isostatic pressing has a uniform distribution of compact density and low firing shrinkage, but it is difficult to precisely control the size and shape, and the productivity is low.

Tape casting is easy to operate, efficient in production, capable of continuous operation, and has a high level of automation. The density of the embryo body and the elasticity of the diaphragm are large. The processing technology is mature. The production specifications are controllable and products of various specifications can be produced. For these reasons, tape casting is widely used in the production of alumina ceramic wafers.

0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer

Manufacturing Capacity

1. Product Specification of 99.6% Alumina Ceramic Substrates

We can make various specifications. The table below shows our standard sizes.

 

99.6% Alumina Ceramic Wafer
Thickness (mm) Maximum Size (mm) Shape Molding Technique
As Fired Lapped Polished Rectangular Square Round
0.1-0.2   50.8 50.8   Tape Casting
0.25   114.3 114.3     Tape Casting
0.38 120 114.3 114.3     Tape Casting
0.5 120 114.3 114.3     Tape Casting
0.635 120 114.3 114.3     Tape Casting
Other special thicknesses within the thickness range of 0.1-0.635mm can be achieved by lapping.

2. Product Tolerances
 
99.6% Alumina Ceramic Wafer
Item Substrate Thickness (mm) Standard Tolerance (mm) Best Tolerance (mm) Laser Cutting Tolerance (mm)
Length and Width Tolerance / ±2   ±0.15
Thickness Tolerance T<0.3 ±0.03 ±0.01  
0.30-1.0 ±0.05 ±0.01  
T>1.0 ±10% ±0.01  

Applications

0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer

Why Choose Us?

1. We provide personalized customization services. Machining services for products includes lapping, polishing, laser scribing, laser cutting, etc.
 
Surface Roughness

99.6% Alumina Ceramic Wafer
Surface Roughness (μm)
As Fired Lapped Polished
Ra 0.05-0.15 Ra 0.1-0.5 Ra ≤0.05

Laser Processing: Hole Size
 
99.6% Alumina Ceramic Wafer
Hole Diameter (mm) Standard Tolerance (mm)
φ≤0.5 0.08
φ>0.5 0.2

2. In order to meet different market requirements, we put our unceasing efforts into promoting quality control. Please contact us for further information.

0.1mm 0.2mm Ultra-Thin 99.6% Aluminum Oxide Sheet Al2O3 Alumina Ceramic Wafer

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